Epitaxial structure of N-face AlGaN/GaN, active device, and method for fabricating the same with integration and polarity inversion

ABSTRACT

The present invention provides an epitaxial structure of N-face AlGaN/GaN, its active device, and the method for fabricating the same. The structure comprises a substrate, a C-doped buffer layer on the substrate, a C-doped i-GaN layer on the C-doped buffer layer, a i-Al y GaN buffer layer on the C-doped i-GaN layer, an i-GaN channel layer on the C-doped i-Al y GaN buffer layer, and an i-Al x GaN layer on the i-GaN channel layer, where x=0.1˜0.3 and y=0.05˜0.75. By using the p-GaN inverted trapezoidal gate or anode structure in device design, the 2DEG in the epitaxial structure of N-face AlGaN/GaN below the p-GaN inverted trapezoidal gate structure will be depleted. Then the 2DEG is located at the junction between the i-GaN channel layer and the i-Al y GaN layer, and thus fabricating p-GaN gate enhancement-mode (E-mode) AlGaN/GaN high electron mobility transistors (HEMTs).

FIELD OF THE INVENTION

The present invention relates generally to an epitaxial structure, and particularly to an epitaxial structure of N-face AlGaN/GaN grown in series on semiconductors, its active device, and the method for fabricating the same with integration.

BACKGROUND OF THE INVENTION

According to the prior art, the most common structures to achieve an enhancement-mode AlGaN/GaN high electron mobility transistor (E-mode AlGaN/GaN HEMT) include: 1. Ga-face p-GaN gate E-mode HEMT structure, and 2. N-face Al_(x)GaN gate E-mode HEMT structure. Nonetheless, as implied by their names, only the gate region will be p-GaN or Al_(x)GaN.

The most common fabrication method is to adopt and epitaxial structure. Etch the p-GaN outside the gate region using dry etching while maintaining the completeness of the thickness of the underlying epitaxial layer. Because if the underlying epitaxial layer is etched too much, the two-dimensional electron gas (2DEG) will not be formed at the interface of AlGaN/GaN of an N-face p-GaN gate E-mode HEMT structure. Thereby, using dry etching is challenging because the etching depth is hard to control and nonuniformity in thickness still occurs in every epitaxial layer of an epitaxial wafer. Besides, both this epitaxial structure and the normal D-Mode AlGaN/GaN HEMT epitaxial structure face the problems related to current collapse, such as buffer traps and surface traps, requiring further resolution.

Accordingly, to improve the above drawbacks, the present invention provides a novel epitaxial structure of AlGaN/GaN, an active device formed by using the epitaxial structure, and the fabrication method for integration.

SUMMARY

An objective of the present invention is to provide a novel epitaxial structure of N-face AlGaN/GaN, an active device formed by using the epitaxial structure after polarity inversion, and the fabrication method for integration for solving the process bottleneck encountered in the epitaxial structure of HEMTs. In addition, multiple types of high-voltage and high-speed active devices can be formed on the substrate of the epitaxial structure of N-face AlGaN/GaN at the same time.

Another objective of the present invention is to make the 2DEG in an epitaxial structure of N-face AlGaN/GaN under the p-GaN inverted trapezoidal gate structure become depleted by using a p-GaN inverted trapezoidal gate or anode structure. Thereby, p-GaN gate E-mode AlGaN/GaN HEMTs, p-GaN anode AlGaN/GaN Schottky barrier diodes (SBDs), or hybrid devices can be fabricated.

In order to achieve the above objectives, the present invention provides an epitaxial structure of N-face AlGaN/GaN, which comprises a substrate, a C-doped buffer layer on the substrate, a C-doped i-GaN layer on the C-doped buffer layer, a i-Al_(y)GaN buffer layer on the C-doped i-GaN layer, an i-GaN channel layer on the i-Al_(y)GaN buffer layer, and an i-Al_(x)GaN layer on the i-GaN channel layer, where x=0.1˜0.3 and y=0.05˜0.75.

By using the epitaxial structure of N-face AlGaN/GaN, the present invention further provides multiple types of transistors having a p-GaN inverted trapezoidal gate structure or SBD devices as well as the method for fabricating the same.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows distributions of E_(PS) and E_(PZ) in Ga-face and N-face AlGaN/GaN and GaN/InGaN systems in different stains according to the present invention;

FIG. 2 shows a schematic diagram of Ga-face and N-face GaN grown on a substrate;

FIG. 3 shows a schematic diagram of the different locations of 2DEG generated at the junctions between AlGaN and GaN due to different polarization according to the present invention;

FIG. 4A shows a band diagram of a p-GaN layer grown on the epitaxial structure of N-face AlGaN/GaN HEMT according to the present invention;

FIG. 4B˜4D show the operations of the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion at a fixed Vd and varying gate voltages Vg according to the present invention;

FIG. 5A shows a first structure diagram of the epitaxial structure of the N-face AlGaN/GaN HEMT according to the present invention;

FIG. 5B shows a second structure diagram of the epitaxial structure of the N-face AlGaN/GaN HEMT according to the present invention;

FIG. 6A-1 and FIG. 6A-2 show cross-sectional views of the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 6B shows a top view of the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 7A and FIG. 7B show schematic diagrams of forming the p-GaN gate in the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 7C shows a schematic diagram of forming the metal drain and source electrodes in the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 7D-1 and FIG. 7D-2 show schematic diagrams of forming isolation in the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 7E-1 and FIG. 7E-2 show schematic diagrams of forming the metal gate electrode and the bonding pads and interconnection metals for drain and source in the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 8A-1 and FIG. 8A-2 show cross-sectional views of the SEG p-GaN anode N-face AlGaN/GaN SBD with polarity inversion according to the present invention;

FIG. 8B shows a top view of the SEG p-GaN anode N-face AlGaN/GaN SBD with polarity inversion according to the present invention;

FIG. 9A shows an equivalent circuit diagram of a hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion formed by cascoding an SEG E-mode N-face AlGaN/GaN HEMT with polarity inversion and a D-mode N-face AlGaN/GaN HEMT with polarity inversion and without gate dielectric layer according to the present invention;

FIG. 9B shows an equivalent circuit diagram of a hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion formed by cascoding an SEG E-mode N-face AlGaN/GaN HEMT with polarity inversion and a D-mode N-face AlGaN/GaN HEMT with polarity inversion and gate dielectric layer according to the present invention;

FIG. 10A shows a schematic diagram of the equivalent circuit in FIG. 9A after being turned on according to the present invention;

FIG. 10B shows a schematic diagram of the equivalent circuit in FIG. 9B after being turned on according to the present invention;

FIG. 11A-1 and FIG. 11A-2 show cross-sectional views of the structure of the hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 11B shows a top view of the transistors in FIG. 11A-1 and FIG. 11A-2;

FIGS. 12A to 12F-2 show schematic diagrams of the process steps for fabricating the structures in FIG. 11A-1 and FIG. 11A-2 according to the present invention;

FIG. 13A-1 and FIG. 13A-2 show cross-sectional views of the structure of another hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 13B shows a top view of the transistors in FIG. 13A-1 and FIG. 13A-2;

FIGS. 14A-1 to 14A-4 show schematic diagrams of the process steps for fabricating the structures in FIG. 13A-1 and FIG. 13A-2 according to the present invention;

FIG. 15 shows an equivalent circuit diagram of a hybrid N-face AlGaN/GaN SBD with polarity inversion formed by cascoding an SEG p-GaN anode N-face AlGaN/GaN SBD with polarity inversion and an SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention.

FIG. 16A-1 and FIG. 16A-2 are cross-sectional views of the hybrid N-face AlGaN/GaN SBD with polarity inversion according to the present invention;

FIG. 16B shows a top view of FIG. 16A-1 and FIG. 16A-2;

FIG. 17A-1 and FIG. 17A-2 show cross-sectional views of another hybrid N-face AlGaN/GaN SBD with polarity inversion according to the present invention;

FIG. 17B shows a top view of FIG. 17A-1 and FIG. 17A-2;

FIG. 18A-1 and FIG. 18A-2 show cross-sectional views of the SEG p-GaN gate and self-aligned gate metal E-mode G-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 18B shows a top view of FIGS. 18A-1 and 18A-2;

FIGS. 19A to 19F-2 show cross-sectional views of the process steps for FIG. 18A-1 and FIG. 18A-2;

FIG. 20A-1 and FIG. 20A-2 show cross-sectional views of the SEG p-GaN anode and self-aligned gate metal E-mode N-face AlGaN/GaN SBD with polarity inversion according to the present invention;

FIG. 20B shows a top view of FIG. 20A-1 and FIG. 20A-2;

FIG. 21A-1 and FIG. 21A-2 show cross-sectional views of the hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 21B shows a top view of FIG. 21A-1 and FIG. 21A-2;

FIG. 22A to FIG. 22G-2 show cross-sectional views of the process steps for FIG. 21A-1 and FIG. 21A-2;

FIG. 23A-1 and FIG. 23A-2 show cross-sectional views of the hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention;

FIG. 23B shows a top view of FIG. 23A-1 and FIG. 23A-2;

FIG. 24A-1 to FIG. 24B-2 show cross-sectional views of the process steps for FIGS. 23A-1 and 23A-2;

FIG. 25A-1 and FIG. 25A-2 show cross-sectional views of the hybrid N-face AlGaN/GaN SBD with polarity inversion according to the present invention;

FIG. 25B shows a top view of FIG. 25A-1 and FIG. 25A-2;

FIG. 26A-1 and FIG. 26A-2 show cross-sectional views of the hybrid N-face AlGaN/GaN SBD with polarity inversion according to the present invention; and

FIG. 26B shows a top view of FIG. 26A-1 and FIG. 26A-2.

DETAILED DESCRIPTION

In order to make the structure and characteristics as well as the effectiveness of the present invention to be further understood and recognized, the detailed description of the present invention is provided as follows along with embodiments and accompanying figures.

FIG. 1 shows distributions of E_(PS) and E_(PZ) in Ga-face and N-face AlGaN/GaN and GaN/InGaN systems in different stains according to the present invention, where E_(PS) is the spontaneous polarization (the polarization of the material) while E_(PZ) is the piezoelectric polarization (the polarization formed by the piezoelectric effect of strain). Thereby, E_(PS) is determined by the epitaxial layers while E_(PZ) is determined by the piezoelectric effect of strain.

In the AlGaN/GaN system, the value of E_(PZ) is negative when AlGaN is under tensile strain and is positive when AlGaN is under compressive strain. Contrarily, in the GaN/InGaN system, the signs for the values of E_(PZ) are opposite. In addition, according to Reference [2], it is known that, firstly, in the AlGaN/GaN system, the polarization is determined by E_(SP), and secondly, in the GaN/InGaN system, the polarization is determined by E_(PZ).

As shown in FIG. 2, P is spontaneous polarization and E is the corresponding electric field. In GaN, the Ga-face (N-face) polarization is determined when the Ga atom (N atom) layer of the Ga-N dual-layer faces the surface of epitaxy. As shown in the figure, a schematic diagram of Ga-face and N-face GaN grown on a substrate is illustrated. If it is Ga-face polarization, the internal electric field is away from the substrate and pointing to the surface. Thereby, the polarization is opposite to the direction of the internal electric field. Consequently, the polarization will cause negative charges to accumulate on the surface of lattice and positive charges to accumulate at the junction with the substrate. On the contrary, if it is N-face polarization, the locations of charge accumulation are swapped and the direction of internal electric field is opposite. In the figure, P1 is the polarization-induced fixed charges; P2 is the compensating surface charges.

For an AlGaN/GaN HEMT, the most important thing is how the Ga- and N-face polarization influence the device characteristics. FIG. 3 shows a schematic diagram of the different locations of 2DEG generated at the junctions between AlGaN and GaN due to different polarization. In the Ga-face structure, 2DEG exists at the AlGaN/GaN interface inside the GaN layer while in the N-face structure, 2DEG exists at the GaN/AlGaN interface inside the GaN layer. The existence of 2DEG indicates accumulation of positive polarization charges at the interface and the 2DEG itself is just the accumulation of free electrons for compensating the polarization charges.

As shown in FIGS. 4A to 4D, the principle of p-GaN gate E-mode AlGaN/GaN HEMT can be viewed from two perspectives. First, by viewing from the polarization electric field, after a p-GaN layer is grown on the epitaxial structure of AlGaN/GaN HEMT, this p-GaN layer will generate a polarization electric field to deplete the 2DEG in the i-GaN channel layer. Secondly, by viewing from the energy band, as shown in FIG. 4A, after a p-GaN layer is grown on the epitaxial structure of AlGaN/GaN HEMT, this p-GaN layer will raise the energy band of the barrier layer i-AlGaN. Thereby, the original potential well at the i-AlGaN/i-GaN junction will be raised above the Fermi energy level, and hence disabling 2DEG from forming.

As shown in FIG. 4B, as the voltage of the p-type gate G is less than or equal to 0, the 2DEG below is completely depleted. Thereby, the current from the drain D cannot pass the channel to reach the source S. As shown in FIG. 4C, as the voltage of the p-type gate G is greater than 0, the potential well at the i-AlGaN/i-GaN junction is suppressed below the Fermi energy level. Thereby, electrons will refill the potential well below and forming 2DEG. When the 2DEG is recovered completely, this positive voltage is defined as the threshold voltage Vth. At this moment, the channel is turned on again and the current from the drain D can pass the channel to reach the source S. In addition, as shown in the equivalent circuit diagram of FIG. 4D, the gate G of the p-GaN gate E-mode AlGaN/GaN HEMT versus the drain D and the gate G versus the source S can be viewed as two SBDs connected back-to-back. Thereby, when Vgs is greater than VF, the SBD between the gate G and the drain D will be turned on. At this time, the holes (positive charges) from the p-GaN gate will be injected into the 2DEG. Consequently, to maintain electrical neutrality of the channel layer, the number of electrons in the channel will be increased, leading to an increase of the concentration of the 2DEG. At this moment, to enable electrons to compensate the injected holes rapidly for maintaining electrical neutrality of the channel layer, the electron mobility will be increased. Once the electron mobility is increased, the drain current will be increased accordingly, resulting in an increase in the operating current of the whole device. Besides, because the hole mobility is lower than at least a half of the electron mobility, holes will be confined and accumulated in the channel below the gate G. Thereby, the leakage current of the gate G can be reduced effectively. The gate G electrode, which is an electrode formed by Ni/Au, Pt/Au, Mo, TiN for forming Schottky contacts, of the p-GaN gate HEMT contacts the p-GaN directly and holes will be confined and accumulated in the channel below the gate G. Unfortunately, when Vgs is much greater than VF, the conduction current of the SBD between the gate G and the drain D is so large that holes cannot be confined and accumulated in the channel below the gate G. Massive holes will be injected into the channel layer and making the gate leakage current increase rapidly. Hence, the transistor can no longer operate in the desired condition. Accordingly, the limited value of Vgs is always the shortcoming of a p-GaN gate E-mode AlGaN/GaN HEMT. In general, due to different epitaxy and process conditions, Vgs(max) is around 5˜7V. In addition, the metal electrodes for forming Schottky contacts can include composite electrodes, compound electrodes, or element electrodes, for example, Ni/Au, Pt/Au, Mo, and TiN.

FIG. 5A shows a first structure diagram of the epitaxial structure of the N-face AlGaN/GaN HEMT according to the present invention. This epitaxial structure 10 comprises, in order, a silicon substrate 11, a C-doped buffer layer 12, a C-doped i-GaN layer 13, an i-Al_(y)GaN buffer layer 14, an i-GaN channel layer 15, and an i-Al_(x)GaN layer 16. The i-Al_(y)GaN buffer layer 14 also act as a role for blocking the electrons of the buffer traps from entering the channel layer and thus avoiding current collapse of the device when the polarity of the i-Al_(y)GaN buffer layer 14, the i-GaN channel layer 15, and the i-Al_(x)GaN layer 16 is inversed into Ga-Face after the device process is finished. FIG. 5B shows a second structure diagram of the epitaxial structure of the N-face AlGaN/GaN HEMT according to the present invention. The difference between the second structure and the first is that an i-Al_(z)GaN grading buffer layer 17 is added to the second structure, where z=0.01˜0.75.

The present invention adopts an inverted trapezoidal gate structure 26 (as shown in FIG. 6A-1) and uses selective epitaxial growth (SEG) for growing p-type GaN for the gate of an AlGaN/GaN D-Mode HEMT and the anode of an AlGaN/GaN SBD. Due to the existence of the p-type GaN (the inverted trapezoidal gate structure 26), the 2DEG below the region of the p-type GaN inverted trapezoidal gate structure 26 will be depleted. Finally, the stress generated by the passivation layer 40 is used to invert the polarity of the active region (i-Al_(x)GaN/i-GaN/i-Al_(y)GaN) from N-face polarity to Ga-face polarity. This explains why the 2DEG is located at the junction of i-Al_(x)GaN and i-GaN in the i-GaN channel layer 15 after completion of fabrication in FIG. 6A-1, because the original N-face polarity has been inverted to the Ga-face polarity. Thereby, an SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion and an SEG p-GaN anode N-face AlGaN/GaN SBD with polarity inversion can be fabricated.

Embodiment 1 is an SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion.

As shown in FIGS. 6A-1 to 6B, the characteristics of the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention include the epitaxial structure 10 of AlGaN/GaN designed according to the present invention and a p-GaN inverted trapezoidal gate structure 26 located on the first i-Al_(x)GaN layer 16 (the i-GaN channel layer 15). Although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN in the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal gate structure 26 in the i-GaN channel layer 15 will be depleted. Likewise, because p-GaN gate is an inverted trapezoidal structure, as shown in FIG. 6A-1 and FIG. 6A-2, a sloped capacitor will be formed. This capacitor will induce the field plate effect having the main function of dispersing the high-density electric field below the gate electrode, as shown in FIG. 6A-1 and FIG. 6A-2.

In the structure of the E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present invention, a source ohmic contact 28 and a drain ohmic contact 30 are formed on the epitaxial structure 10. They are disposed on the sides of the p-GaN inverted trapezoidal gate structure 26, respectively. The related metal interconnect and passivation layers are included as well, such as the gate metal of the p-GaN inverted trapezoidal gate structure 26 and the interconnection metal layer 36 connected with the source ohmic contact 28 and the drain ohmic contact 30.

In the following, the fabrication method for the present embodiment will be described. Nonetheless, a person having ordinary skill in the art should know that the present embodiment and its metal layout is not limited to the fabrication method.

Step S11: Pattern the silicon oxynitride mask layer 20. First, as shown in FIG. 7A, deposited a silicon oxynitride (SiO_(x)N_(y)) mask layer 20 on the epitaxial structure 10 of N-face AlGaN/GaN according to the present invention using plasma-enhanced chemical vapor deposition (PECVD) with a thickness of around 100-200nm. This mask layer must not induce any stress to the epitaxial structure 10 of N-face AlGaN/GaN, otherwise the polarity of the epitaxy will be inverted. Next, define the region 24 for the SEG gate by using photoresist and exposure method and using a photoresist 22. Finally, the silicon oxynitride mask layer 20 in the region 24 is etched by a wet etching method using buffered oxide etchant (BOE) to expose the surface of the epitaxy. Then, the photoresist 22 is stripped using stripper. Because wet etching is isotropic, in addition to etching downward, lateral etching will occur concurrently. Thereby, the opening of the silicon oxynitride mask layer 20 in the region 24 will form an inverted trapezoidal structure.

Step S12: Form the p-GaN inverted trapezoidal structure 26 using SEG. First, p-GaN SEG is performed using metal-organic chemical vapor deposition (MOCVD) and only the exposed surface of the epitaxy can grow p-GaN. Because the growth of p-GaN in MOCVD is also isotropic, in addition to growing upward, lateral growth will occur concurrently and thus forming an inverted trapezoidal structure of p-GaN, which is just the p-GaN inverted trapezoidal structure 26. Finally, the silicon oxynitride mask layer 20 is etched by a wet etching method using BOE and forming the structure shown in FIG. 7B.

Then, because the p-GaN SEG region 24 occupies only a small portion of the whole epitaxy wafer, the loading effect will occur easily. Namely, the growth rate on the defined region for p-GaN is three to four times the growth rate on the general surface. Thereby, the p-type doping concentration in p-GaN will be equal to ⅓ to ¼ of the expected.

Step S13: Form the drain ohmic contact 30 and the source ohmic contact 28. A metal layer, for example, a general Ti/Al/Ti/Au or Ti/Al/Ni/Au metal layer, is deposited on the epitaxy wafer using metal vapor deposition. Then a metal lift-off method is adopted to pattern the deposited metal layer for forming the drain and source electrodes on the epitaxy wafer. Afterwards, a thermal treatment is performed at 700˜900° C. for 30 seconds to make the drain and source electrodes become ohmic contacts 30, 28, as shown in FIG. 7C.

Step S14: Perform device isolation process. In this step, the multiple-energy destructive ion implantation is adopted to form the device isolation structure 32. In general, heavy atoms such as boron or oxygen atoms are used for isolating devices, as shown in FIG. 7D-1. Alternatively, dry etching to the highly resistive C-doped i-GaN buffer layer 12 can be adopted for forming the device isolation structure 34 and thus isolating devices, as shown in FIG. 7D-2.

Step S15: Perform the metal wiring process. In this step, metal deposition is performed. Metal vapor deposition and lift-off methods are used for patterning the Ni/Au metal layer 36 and forming bonding pads for the gate, drain, and source electrodes as well as the metal interconnection 36, as shown in FIGS. 7E-1 and 7E-2. While performing metal wiring, for example, the gate metal on the p-GaN inverted trapezoidal gate structure 26 and the bonding pads for the gate electrode should be connected.

Step S16: Deposit and pattern passivation layer. A passivation layer 40 is grown by PECVD. The material is selected from the group consisting of SiO_(x), SiO_(x)N_(y), or SiN_(x); the thickness is greater than 1000 Å. By taking advantage of the stress generated by the passivation layer 40, the polarity of the active region (i-Al_(x)GaN layer 16/i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14) can be inverted from N-face to Ga-face, and hence the 2DEG 6 can be moved from the i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14 interface of the i-GaN channel layer 15 to the i-Al_(x)GaN layer 16/i-GaN channel layer 15 interface of the i-GaN channel layer 15. Finally, the passivation layer 40 is patterned for exposing the bonding pad region. For example, wet etching using BOE is adopted for exposing the bonding pad region for subsequent wire bonding.

Because the p-GaN is an inverted trapezoidal structure, a sloped capacitor will be formed in the circle shown in FIG. 6A-1. This capacitor will induce the field plate effect having the main function of dispersing the high-density electric field below the gate electrode. In addition to increasing the breakdown voltage Vds between the drain and the source of the HEMT, it also suppresses the electron trapping effect below the gate electrode and hence reducing current collapse during the operation of the HEMT.

Embodiment 2 is a SEG p-GaN anode N-face AlGaN/GaN SBD with polarity inversion.

As shown in FIGS. 8A-1 to 8A-2, the characteristics of the SEG p-GaN anode N-face AlGaN/GaN SBD with polarity inversion according to the present invention include the epitaxial structure 10 of AlGaN/GaN designed according to the present invention and a p-GaN inverted trapezoidal anode structure 82 located on the first i-Al_(x)GaN layer 16 according to Embodiment 2. Although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal anode structure 82, the 2DEG 6 below the p-GaN inverted trapezoidal anode structure 82 in the i-GaN channel layer 15 will be depleted.

Because the steps for Embodiment 2 are identical to those for Embodiment 1, the details will not be described again. In the process, first, as described above, a patterned silicon oxynitride mask layer 20 having an inverted trapezoidal structure is formed on the epitaxial structure 10 for defining the SEG region for the anode structure. Next, SEG of p-GaN is performed on the epitaxy wafer using MOCVD for forming a p-GaN inverted trapezoidal anode structure. Afterwards, the patterned silicon oxynitride mask layer 20 is removed.

Then, as described above, because the p-GaN SEG region occupies only a small portion of the whole epitaxy wafer, the loading effect will occur easily. Namely, the growth rate on the defined region for p-GaN is three to four times the growth rate on the general surface. Thereby, the p-type doping concentration in p-GaN will be equal to ⅓ to ¼ of the expected.

Then, cathode metals are formed on both sides of the p-GaN inverted trapezoidal anode structure on the epitaxy wafer, respectively, and a thermal treatment of 700˜900° C. is performed for 30 seconds for forming cathode ohmic contacts 44. Next, as described above, multiple-energy destructive ion implantation or dry etching are used for forming the device isolation structure 32.

As shown in FIG. 8B, the metal wiring process is performed. According to the present embodiment, an anode metal layer, an anode bonding pad region 43 connected to the anode metal layer, an interconnection metal connected to the cathode ohmic contact, and a cathode bonding pad region 45 connected to the interconnection metal are formed. Finally, form a patterned passivation layer 40 on the epitaxial layer for exposing the anode bonding pad region and the cathode bonding pad region. The epitaxial layer covered by the patterned passivation layer 40 is the device region. In other words, a patterned passivation layer 40 is formed above the device region.

Moreover, the above structure of SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion can be further connected in series with a depletion-mode (D-mode) N-face AlGaN/GaN HEMT with polarity inversion to form a hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion, which can reduce the Early effect of a transistor. FIG. 9A shows an equivalent circuit diagram of the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT M2 with polarity inversion connected in series with a D-mode N-face AlGaN/GaN HEMT M1 with polarity inversion and without the gate dielectric layer 72 according to the present invention. As shown in the figure, an E-mode AlGaN/GaN HEMT M2 is connected in series with a D-mode AlGaN/GaN HEMT M1. In addition, the gate of the D-mode HEMT is connected directly to the source of the E-mode HEMT and to the ground. Overall, it can be regarded as a normally-off E-mode HEMT. Thereby, when a high voltage is applied to the drain of the D-mode HEMT, Vgd of the D-mode HEMT is negative. Hence, the GaN D-mode HEMT remains in off-mode. Accordingly, the whole hybrid E-mode HEMT will not breakdown when a high voltage is applied to the drain of the D-mode HEMT.

Besides, in addition to connecting to a D-mode HEMT M2 without the gate dielectric layer 72, the SEG p-GaN gate AlGaN/GaN E-mode HEMT can be connected in series with another structure of D-mode HEMT M3. FIG. 9B shows an equivalent circuit diagram of the SEG p-GaN gate AlGaN/GaN E-mode HEMT connected in series with a D-mode AlGaN/GaN HEMT M3 with the gate dielectric layer 72 according to the present invention. The difference between a D-mode HEMT without and with the gate dielectric layer 72 is that the pinch-off voltage Vp of a D-mode HEMT without the gate dielectric layer 72 will be smaller than that of one with the gate dielectric layer 72.

FIGS. 10A and 10B show schematic diagrams of the equivalent circuits in FIGS. 9A and 9B after being turned on according to the present invention. As shown in the figures, given the gate voltage Vg fixed, as we apply a Vds (voltage VD2S1), a current Id will flow from the D-mode HEMT M7 to the E-mode HEMT and reaching the source of the E-mode HEMT M6. When the current Id passes the E-mode HEMT M6: VD1=Rds(E-Mode, M6)×Id=−VG2S2 Here, two points should be noted. First, the voltage VD1 is positive, and hence the voltage VGS2S2 is negative. Secondly, when the voltage VD2S1 is small, the initial current Id is proportional to the width Wg2 of the D-mode HEMT M7. In addition, the hybrid E-mode transistors M4, M6 in FIGS. 10A and 10B act as normally-off transistors. The design guidelines can be summarized as follows. First, a short L_(D1S1) and a wide Wg (D-Mode) minimize Rds (E-Mode)+Rds (D-Mode). Secondly, by increasing the distance L_(G2D2) between the gate and drain of the D-mode HEMT M7 as well as a long L_(G2) and a wide Wg (D-Mode), the breakdown voltage of VD2S1 is increased while maintaining Rds (E-Mode)+Rds (D-Mode) minimized and slowing the dropping rate of the current Id. Thereby, the design predictivity of the device is better. Thirdly, by increasing the distance L_(G2D2) between the gate and drain of the D-mode HEMT M7 as well as a wide Wg (D-Mode), the breakdown voltage of VD2S1 is increased while maintaining Rds (E-Mode)+Rds (D-Mode) minimized. Although the dropping rate of the current Id will be faster, given a proper Wg (D-Mode), the chip area will be smaller than the area according to the second design guideline.

Embodiment 3: As shown in FIGS. 11A-1, 11A-2, and 11B, connect an SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT M2 with polarity inversion in series with a D-mode N-face AlGaN/GaN HEMT M1 without gate dielectric layer to form a hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion.

A SEG p-GaN gate E-mode HEMT usually exhibits slight Early effect, which means that the channel cannot be shut off completely and thus leading to increases of the current Ids as Vds increases when the device is operated in the saturation region with the gate voltage Vg fixed. The cascode D-mode HEMT according to the present invention just can solve this problem.

As shown in FIGS. 11A-1, 11A-2, and 11B, the hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion according to Embodiment 3 comprises the epitaxial structure 10 of AlGaN/GaN designed according to the present invention and is divided into a left region and a right region. In the left region, a SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT M2 with polarity inversion is formed. This SEG p-GaN gate E-mode AlGaN/GaN HEMT includes a p-GaN inverted trapezoidal gate structure 26. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal gate structure 26 in the i-GaN channel layer 15 will be depleted. In the right region, a D-mode N-face AlGaN/GaN HEMT M1 with polarity inversion and without gate dielectric layer is formed.

The process for fabricating the present embodiment will be described as follows. First, as shown in FIGS. 12A to 12B, an epitaxial structure 10 of N-face AlGaN/GaN according to the present invention is provided. The left region is set to fabricate the SEG p-GaN E-mode N-face AlGaN/GaN HEMT with polarity inversion while the right region is set to fabricate the D-mode N-face AlGaN/GaN HEMT with polarity inversion. Alternatively, the setting for the left and right regions can be undoubtedly altered according to requirements. Next, as described in the previous fabrication method, form a patterned silicon oxynitride mask layer 20 having an inverted-trapezoidal-structure opening 24 on the epitaxial structure 10 of N-face AlGaN/GaN for defining the region for the SEG p-GaN gate. The thickness of this silicon oxynitride mask layer 20 is around 100 to 200 nm. Then, SEG p-GaN is grown in the inverted-trapezoidal-structure opening 24 and forming a SEG p-GaN inverted trapezoidal structure 26. Afterwards, the patterned silicon oxynitride mask layer 20 is removed. At this moment, as described above, because the p-GaN SEG region occupies only a small portion of the whole epitaxy wafer, the p-type doping concentration in p-GaN will be equal to ⅓ to ¼ of the expected.

Then, use metal vapor deposition and metal lift-off methods to form the drain and source electrodes. Afterwards, a thermal treatment is performed at 700˜900° C. for approximately 30 seconds to make the drain and source electrodes become ohmic contacts 30, 28, as shown in FIG. 12C.

Next, use destructive ion implantation as shown in FIG. 12D-1 or the dry etching to the highly resistive C-doped i-GaN buffer layer 12 as shown in FIG. 12D-2 to isolate devices.

Afterwards, use metal vapor deposition and metal lift-off methods to form the gate electrode, the bonding pad regions for the drain and source electrodes, and the interconnection metal layer 36. Alternatively, in this step, the gate bonding pad region connected electrically with the gate electrode can be formed concurrently, as the structures shown in FIGS. 12E-1 and 12E-2.

A passivation layer 40 is grown by PECVD. The material is selected from the group consisting of SiO_(x), SiO_(x)N_(y), or SiN_(x); the thickness is greater than 1000 Å. By taking advantage of the stress generated by the passivation layer 40, the polarity of the active region (i-Al_(x)GaN layer 16/i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14) can be inverted from N-face to Ga-face, and hence the 2DEG 6 can be moved from the i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14 interface of the i-GaN channel layer 15 to the i-Al_(x)GaN layer 16/i-GaN channel layer 15 interface of the i-GaN channel layer 15. Finally, the passivation layer 40 is patterned for exposing the bonding pad region and the region above the gate metal of the E-mode HEMT, and thus forming the structures shown in FIG. 12F-1 or FIG. 12F-2. Besides, the field plate metal layer R2 is located on the gate structure 26.

Likewise, because the p-GaN inverted trapezoidal gate structure 26 is an inverted trapezoidal structure, as shown in FIG. 12F-1 or FIG. 12F-2, a sloped capacitor will be formed in the circle shown in the figures. This capacitor will induce the field plate effect having the main function of dispersing the high-density electric field below the gate electrode. In addition to increasing the breakdown voltage Vds between the drain and the source of the HEMT, it also suppresses the electron trapping effect below the gate electrode and hence reducing current collapse during the operation of the HEMT.

Finally, the metal vapor deposition and metal left-off methods are adopted to form the D-mode HEMT field plate metal 62, as shown in the final structures in FIG. 11A-1, 11A-2, and 11B.

Embodiment 4: An SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion is connected in series with a D-mode N-face AlGaN/GaN HEMT M3 with polarity inversion and gate dielectric layer to form a hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion.

As shown in FIGS. 13A-1, 13A-2, and 13B, the hybrid E-mode AlGaN/GaN HEMT according to Embodiment 4 comprises the epitaxial structure 10 of N-face AlGaN/GaN designed according to the present invention and is divided into a left region and a right region. In the left region, an SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion is formed. This SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion includes a p-GaN inverted trapezoidal gate structure 26. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal gate structure 26 in the i-GaN channel layer 15 will be depleted. In the right region, a D-mode N-face AlGaN/GaN HEMT M3 with polarity inversion and gate dielectric layer is formed.

The process for fabricating the present embodiment will be described as follows. First, as the step for Embodiment 3, an epitaxial structure 10 of N-face AlGaN/GaN according to the present invention is provided. The left region is set to fabricate the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion while the right region is set to fabricate the D-mode N-face AlGaN/GaN HEMT M3 with polarity inversion and gate dielectric layer. Next, as described in the previous fabrication method, form a patterned silicon oxynitride mask layer 20 having an inverted-trapezoidal-structure opening on the epitaxial structure 10 of N-face AlGaN/GaN for defining the region for the SEG gate. Then, p-GaN is grown in the inverted-trapezoidal-structure opening 24 and forming a p-GaN inverted trapezoidal gate structure 26. Afterwards, the patterned silicon oxynitride mask layer 20 is removed; the drain and source electrodes 28, 30 are formed; and the device isolation 34 is fabricated.

Next, the gate dielectric layer for the D-mode N-face AlGaN/GaN HEMT with polarity inversion is fabricated. An insulating dielectric layer is deposited by PECVD. The material is selected form the group consisting of SiO_(x), SiO_(x)N_(y), or SiN_(x); the thickness is 10 to 100 nm. Then, define the gate oxide region of the D-mode N-face AlGaN/GaN HEMT with polarity inversion and gate dielectric layer by using photoresist and exposure method. Finally, the insulating dielectric layer outside the region is etched by a wet etching method using BOE; the insulating dielectric layer in the gate dielectric layer 72 region is reserved. Afterwards, the photoresist is stripped using stripper and forming the structures shown in FIGS. 14A-1 and 14A-2.

Afterwards, use metal vapor deposition (normally Ni/Au) and metal lift-off methods to form the gate electrode, the bonding pad regions for the drain and source electrodes, and the interconnection metal layer 36, as the structures shown in FIGS. 14A-3 or FIG. 14A-4. In addition, in this step, the metal wiring required for device operations can be formed concurrently. For example, the gate bonding pad region connected electrically with the gate electrode can be formed concurrently. Nonetheless, the present invention is not limited to the top views of the present invention.

Then, a passivation layer 40 is grown by PECVD. The material is selected from the group consisting of SiO_(x), SiO_(x)N_(y), or SiN_(x); the thickness is greater than 1000 Å. By taking advantage of the stress generated by the passivation layer 40, the polarity of the active region (i-Al_(x)GaN layer 16/i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14) can be inverted from N-face to Ga-face, and hence the 2DEG 6 can be moved from the i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14 interface of the i-GaN channel layer 15 to the i-Al_(x)GaN layer 16/i-GaN channel layer 15 interface of the i-GaN channel layer 15. Finally, the passivation layer 40 is patterned for exposing the bonding pad region and the region above the gate metal of the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion, and thus forming the structures shown in FIGS. 13A-1, 13A-2, and 13B.

Likewise, because the p-GaN is an inverted trapezoidal structure, as shown in FIG. 12B, a sloped capacitor will be formed (as shown in FIG. 12F-1). This capacitor will induce the field plate effect having the main function of dispersing the high-density electric field below the gate electrode. In addition to increasing the breakdown voltage Vds between the drain and the source of the HEMT, it also suppresses the electron trapping effect below the gate electrode and hence reducing current collapse during the operation of the HEMT.

Finally, the metal vapor deposition and metal left-off methods are adopted to form the D-mode HEMT field plate metal 62.

Embodiment 5: As shown in FIGS. 16A-1, 16A-2, and 16B, an SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT M4 with polarity inversion is connected in series with an SEG p-GaN anode N-face AlGaN/GaN SBD D1 with polarity inversion to form a hybrid N-face AlGaN/GaN SBD with polarity inversion. FIG. 15 shows the equivalent circuit diagram of the above architecture. An AlGaN/GaN SBD is connected in series with an E-mode AlGaN/GaN HEMT. When a positive voltage is applied to the anode, the SBD will be turned on. In addition, because the anode also applies the positive voltage to the gate, the E-mode HEMT is completely turned on as well. Thereby, the current can flow to the cathode smoothly. When a positive voltage is applied to the cathode, the voltage Vgs of the E-Mode AlGaN/GaN HEMT is negative. Hence, the GaN E-mode HEMT is shut off, and thus protecting the AlGaN/GaN SBD from breakdown under reverse bias. Besides, because the E-mode AlGaN/GaN HEMT is a current negative temperature coefficient device while the AlGaN/GaN SBD is a current positive temperature coefficient device, they are complementary to each other once connected in series. Accordingly, while this hybrid device is operating at a fixed voltage, its current won't be influenced easily by temperature changes.

The feature of this hybrid N-face SBD is that, as described above, 2DEG 6 cannot exist below the SEG p-GaN anode and the SEG p-GaN gate unless a positive voltage is applied. Thereby, when a reverse bias is applied to the cathode, the reverse breakdown voltage Vds can be increased and the reverse leakage current can be suppressed effectively.

As shown in FIGS. 16A-1 to 16B, the hybrid N-face SBD according to Embodiment 5 comprises the epitaxial structure 10 of AlGaN/GaN designed according to the present invention and is divided into a left region and a right region. In the left region, an SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT 50 with polarity inversion is formed. This SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT 50 with polarity inversion includes a p-GaN inverted trapezoidal gate structure 26. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal structure in the i-GaN channel layer 15 will be depleted. In the right region, an SEG p-GaN anode N-face AlGaN/GaN SBD 80 with polarity inversion is formed, which includes a p-GaN inverted anode structure 82. Thereby, the 2DEG 6 below the p-GaN inverted anode structure 82 in the i-GaN channel layer 15 will be depleted.

The process for fabricating the present embodiment will be the same as the one for fabricating the previous embodiment. Hence, the details will not be repeated. The main difference is described as follow. A patterned silicon oxynitride mask layer 20 is formed on the epitaxial structure 10 of N-face AlGaN/GaN. The left region includes an inverted-trapezoidal-structure opening while the right region includes an anode-structure opening for defining the region for the SEG gate in the left region and the region for the SEG anode structure in the right region. Then, the p-GaN is grown in the openings. Afterwards, the patterned silicon oxynitride mask layer 20 is removed for forming a p-GaN inverted trapezoidal gate structure and a p-GaN inverted trapezoidal anode structure. Next, the drain and source ohmic contacts 28, 30 are formed in the left region and the cathode ohmic contact 84 is formed in the right region concurrently. Afterwards, the device isolation is fabricated.

Then, metal vapor deposition and metal lift-off methods are used to form the metal layer 36, which is used as the gate electrode and the related wiring, such as the drain and source bonding pad regions and the interconnection metal, and the anode and cathode bonding pad regions and the interconnection metal. Furthermore, the drain and anode metals are connected. In addition, in this step, the metal wiring required for device operations can be formed concurrently. For example, the gate bonding pad region connected electrically with the gate electrode can be formed concurrently. Nonetheless, the present invention is not limited to the top views of the present invention. Finally, a patterned passivation layer 40 is formed on the epitaxial layer and a portion of the metal layer 36 is exposed.

As shown in FIGS. 17A-1 to 17B, in Embodiment 6, an SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT 50 with polarity inversion is connected in series with an N-face AlGaN/GaN SBD 90 with polarity inversion and field-plate anode to form a hybrid SBD.

As shown in the figures, the hybrid N-face SBD with polarity inversion according to Embodiment 6 comprises the epitaxial structure 10 of AlGaN/GaN designed according to the present invention and is divided into a left region and a right region. In the left region, an SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT 50 with polarity inversion is formed. This SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT 50 with polarity inversion includes a p-GaN inverted trapezoidal gate structure 26. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal gate structure 26 in the i-GaN channel layer 15 will be depleted. In the right region, an N-face AlGaN/GaN SBD with polarity inversion and field-plate anode is formed.

The features of this hybrid N-face SBD are the field-plate anode and the SEG p-GaN gate. As described above, the 2DEG 6 cannot exist below the p-GaN gate unless a positive voltage is applied. Thereby, when a reverse bias is applied to the cathode, the reverse breakdown voltage Vds can be increased and the reverse leakage current can be suppressed effectively.

Although the functions and characteristics of Embodiments 6 and 5 are similar, the reverse breakdown voltage Vds of Embodiment 5 is higher at the expense of a higher startup voltage Vf. On the contrary, the reverse breakdown voltage Vds of Embodiment 6 is lower. But it also features a lower startup voltage Vf. Hence, according to different application requirements, these two solutions can be considered.

The main difference in the processes of Embodiment 6 and Embodiment 5 is described as follow. A patterned silicon oxynitride mask layer 20 is formed on the epitaxial structure 10 of N-face AlGaN/GaN. The left region includes an inverted-trapezoidal-structure opening for defining the region for the SEG gate in the left region. Then, the p-GaN is grown in the openings. Afterwards, the patterned silicon oxynitride mask layer 20 is removed for forming a p-GaN inverted trapezoidal gate structure 26. Next, the device isolation is fabricated. Then, a field-plate-anode dielectric layer 92 is formed in the right region, the drain and source ohmic contacts 30, 28 are formed in the left region, and the cathode ohmic contact 84 is formed in the right region concurrently, as the structures shown in FIG. 17A-1 or FIG. 17A-2.

Next, as described above, form the metal layer 36 for the gate electrode and the related wiring. Finally, a patterned passivation layer 40 is formed on the epitaxial layer and a portion of the metal layer 36 is exposed, as the top view shown in FIG. 17B.

Embodiment 7: SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion.

As shown in FIGS. 18A-1, 18A-2, and 18B, the transistor 100 according to the present embodiment comprises the epitaxial structure 10 of N-face AlGaN/GaN. A p-GaN inverted trapezoidal gate structure 26, a first source metal layer 28′, and a first drain metal layer 30′ are formed on the i-Al_(x)GaN layer 16 of the epitaxial structure 10. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal gate structure 26 in the i-GaN channel layer 15 will be depleted. The i-Al_(x)GaN layer 16 of the epitaxial structure 10 includes a first source ion implantation region 101 and a first drain ion implantation region 102. Besides, the first source ion implantation region 101 is located below the first source metal layer 28′, while the first drain ion implantation region 102 is located below the first drain metal layer 30′. Moreover, a first gate metal layer 103 is disposed on the p-GaN inverted trapezoidal gate structure 26.

The major difference between the SEG p-GaN gate and self-align gate metal E-mode N-face AlGaN/GaN HEMT with polarity inversion and the SEG p-GaN gate E-mode N-face AlGaN/GaN HEMT with polarity inversion described in the previous embodiment is the contact area ratio of the gate metal and the SEG p-GaN gate. According to the principle of the previous embodiment, when Vgs is much greater than VF, the conduction current of the SBD between the gate and the drain is so large that holes cannot be confined and accumulated in the channel below the gate. Massive holes will be injected into the channel layer and making the gate leakage current increase rapidly. Hence, the transistor can no longer operate in the desired condition. Accordingly, the limited value of Vgs is always the shortcoming of a p-GaN gate E-mode AlGaN/GaN HEMT. Fortunately, the contact area ratio of the SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT with polarity inversion and the SEG p-GaN gate is much larger than the one according to the previous embodiment (completely covered p-GaN gate). Thereby, when Vgs is greater than VF, the injected holes by the gate is more uniform. The electric field distribution is more uniform as well. Accordingly, Vgs max (self-aligned gate metal) is greater than Vgs max (non-self-aligned gate metal). Then there will be more margin for the operation of Vgs.

A thermal treatment at 700□˜900□ is required for the drain and source electrodes to form ohmic contacts with i-Al_(x)GaN. In a general HEMT fabrication process, the gate metal is fabricated after the thermal treatment for the drain and source electrodes. Thereby, the Schottky contact between the gate metal and the i-Al_(x)GaN will not be damaged due to this high-temperature thermal treatment. Nonetheless, for the SEG p-GaN gate and self-aligned gate metal HEMT, the gate metal is fabricated prior to the drain and source electrodes. In order to prevent damages on the characteristics of the Schottky contact formed by the gate and the i-Al_(x)GaN by the thermal treatment, multiple ion implantation is adopted to implant n-type silicon dopants below the drain and source electrodes. Thereby, the drain and source can form ohmic contacts with the i-Al_(x)GaN without the 700□˜900□ thermal treatment.

Step 71: Use multiple ion implantation to implant n-type silicon dopants below the drain and source electrodes and activate by thermal treatment to form a first source ion implantation region 101 and a first drain ion implantation region 102. The ion implantation is shallow and the concentration distribution of ions implanted into the i-Al_(x)GaN is Gaussian. We expect the peak value of the Gaussian distribution is as close to the surface of the i-Al_(x)GaN as possible, as shown in FIG. 19A. First, use PECVD to deposit a layer of SiO₂ mask 105 as a buffer layer. Thereby, during ion implantation, the peak value of the Gaussian distribution is close to the surface of the i-Al_(x)GaN. Next, use photolithography to form a patterned photoresist layer 104 and define the ion implantation regions below the drain and source electrodes. Then, the multiple ion implantation is adopted to implant n-type silicon dopants below the drain and source electrodes. After the ion implantation is finished, the patterned photoresist layer 104 and the SiO₂ mask 105 is removed.

Afterwards, a thermal treatment at a temperature between 600° and 900° is performed for activating the n-type silicon dopants and forming the first source ion implantation region 101 and the first drain ion implantation region 102. This thermal treatment can be performed after the step S71. In other words, after the steps of ion implantation and removal of the patterned photoresist layer 104 and the SiO₂ mask 105, thermal treatment at a temperature between 600° and 900° is performed for activation. Alternatively, in the subsequent SEG p-GaN gate using MOCVD, the high temperature for growth can be used for activation simultaneously.

Step S72: Please refer to FIG. 19B as well. Define the SEG p-GaN gate and self-aligned gate metal region. Deposit a silicon oxynitride mask layer 20 using PECVD with a thickness greater than 2500 nm. Next, define the SEG gate region by using the photoresist 22 and the exposure method. Finally, the silicon oxynitride mask layer 20 in the region is etched by a wet etching method using BOE to expose the surface of the epitaxy. Then, the photoresist is stripped using stripper. Because wet etching is isotropic, in addition to etching downward, lateral etching will occur concurrently. Thereby, the opening of the silicon oxynitride mask layer 20 will form an inverted-trapezoidal-structure opening 24.

Step S73: Form the SEG p-GaN gate and self-aligned gate metal. First, SEG p-GaN is performed using MOCVD and only the exposed surface of the epitaxy can grow p-GaN. Because the growth of p-GaN in MOCVD is also isotropic, in addition to growing upward, lateral growth will occur concurrently and thus forming an inverted trapezoidal structure of p-GaN, which is just the p-GaN inverted trapezoidal gate structure 26. Afterwards, gate electrode is coated using metal coating. Finally, the silicon oxynitride mask layer 20 is etched by a wet etching method and the metal outside the gate electrode region is lift off, forming the self-aligned gate metal 102 on the p-GaN inverted trapezoidal gate structure 26, as the structure shown in FIG. 19C.

Step S74: Use metal vapor deposition and lift-off methods to form drain and source electrodes 30, 28, as shown in FIG. 19D.

Step S75: Perform device isolation process. As shown in FIG. 19E-1, multiple-energy destructive ion implantation is adopted. Alternatively, dry etching to the highly resistive C-doped i-GaN buffer layer can be adopted for forming the device isolation structure 32 for isolating devices, as shown in FIG. 19E-2.

Step S76: Perform metal wiring process. Metal vapor deposition and lift-off methods are used for forming the metal layer 36 and forming bonding pads for the drain and source electrodes as well as the metal interconnection, as shown in FIG. 19F-1 or FIG. 19F-2.

Step S77: Pattern the passivation layer. A passivation layer 40 is grown by PECVD. The material is selected from the group consisting of SiO_(x), SiO_(x)N_(y), or SiN_(x); the thickness is greater than 1000 Å. By taking advantage of the stress generated by the passivation layer 40, the polarity of the active region (i-Al_(x)GaN layer 16/i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14) can be inverted from N-face to Ga-face, and hence the 2DEG 6 can be moved from the i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14 interface of the i-GaN channel layer 15 to the i-Al_(x)GaN layer 16/i-GaN channel layer 15 interface of the i-GaN channel layer 15. Finally, the passivation layer 40 is patterned by a wet etching method using BOE for forming a patterned passivation layer 40 and exposing a portion of the metal layer 36, as shown in FIGS. 18A-1, 18A-2, and 18B. For example, etching is adopted for exposing the bonding pad region for subsequent wire bonding.

Because the p-GaN is an inverted trapezoidal gate structure 26, a sloped capacitor will be formed in the circle shown in FIGS. 18A-1 and 18A-2. This capacitor will induce the field plate effect having the main function of dispersing the high-density electric field below the gate electrode. In addition to increasing the breakdown voltage Vds between the drain and the source of the HEMT, it also suppresses the electron trapping effect below the gate electrode and hence reducing current collapse during the operation of the HEMT.

Embodiment 8: SEG p-GaN anode and self-aligned anode metal E-mode N-face AlGaN/GaN SBD with polarity inversion.

As shown in FIGS. 20A-1, 20A-2, and 20B, the SEG p-GaN anode and self-aligned anode metal E-mode N-face AlGaN/GaN SBD with polarity inversion according to the present embodiment comprises the epitaxial structure 10 of N-face AlGaN/GaN. A p-GaN inverted trapezoidal anode structure 26, a first cathode metal layer 29, and a second cathode metal layer 31 are formed on the i-Al_(x)GaN layer 16 of the epitaxial structure 10. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal anode structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal structure 26 in the i-GaN channel layer 15 will be depleted. The i-Al_(x)GaN layer 16 of the epitaxial structure 10 includes a first cathode ion implantation region 101 and a second cathode ion implantation region 102. Besides, the first cathode ion implantation region 101 is located below the first cathode metal layer 29, while the second cathode ion implantation region 102 is located below the second cathode metal layer 31. Moreover, a self-aligned anode metal layer is disposed on the p-GaN inverted trapezoidal anode structure 26 and acting as a first gate metal layer 103. Furthermore, in addition to the above structure, a metal layer 36 enabling the operations of the SBD is also disposed, which is well known to a person having ordinary skill in the art. Hence, the details will not be described again. For example, as shown in FIG. 20B, the metal layer 36 disposed on the first gate metal layer 103 is connected to the external bonding pad region 43 for gate metal; the metal layer 36 on the first and second cathode metal layers 29, 31 are connected to the external bonding pad region 45 for cathodes.

Embodiment 9: A SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion is connected in series with a D-mode N-face AlGaN/GaN HEMT with polarity inversion and without gate dielectric layer to form a hybrid E-mode N-face AlGaN/GaN HEMT 110 with polarity inversion.

As shown in FIGS. 21A-1, 21A-2, and 21B, the main feature of the hybrid E-mode N-face AlGaN/GaN HEMT 110 with polarity inversion according to the present embodiment is the epitaxial structure 10 of N-face AlGaN/GaN, which is divided to a left region and a right region. An SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion is located in the left region and includes a p-GaN inverted trapezoidal gate structure 26, a first source metal layer 28′, a first drain metal layer 30′, a first source ion implantation region 101, a first drain ion implantation region 102, and a self-aligned first gate metal layer 103. The p-GaN inverted trapezoidal gate structure 26, the first source metal layer 28′, and the first drain metal layer 30′ are located on the i-Al_(x)GaN layer 16. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal gate structure 26 in the i-GaN channel layer 15 will be depleted. The first source ion implantation region 101 and the first drain ion implantation region 102 are located in the i-Al_(x)GaN layer 16. Besides, the first source ion implantation region 101 is located below the first source metal layer 28′ while the first drain ion implantation region 102 is located below the first drain metal layer 30′. In addition, the self-aligned first gate metal layer 103 is located on the p-GaN inverted trapezoidal gate structure 26.

A D-mode N-face AlGaN/GaN HEMT 110 with polarity inversion and without gate dielectric layer is disposed in the right region. It includes a second source metal layer 28′, a second drain metal layer 30′, a second source ion implantation region 101′, and a second drain ion implantation region 102′. The second source metal layer 28′ and the second drain metal layer 30′ are located on the i-Al_(x)GaN layer 16. The second source ion implantation region 101′ is located below the second source metal layer 28′ while the second drain ion implantation region 102′ is located below the second drain metal layer 30′.

The fabrication method for the present embodiment will described as follows. First, the left region of the epitaxial structure 10 is set to fabricate the SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion. The right region is set to fabricate the D-mode N-face AlGaN/GaN HEMT 110 with polarity inversion.

Next, as described above, use multiple ion implantation to implant n-type silicon dopants below the drain and source electrodes and activate by thermal treatment to form the structure shown in FIG. 22A.

Use the steps S72 and S73 as described above to form a patterned silicon oxynitride mask layer 20 having an inverted-trapezoidal-structure opening 24, as shown in FIG. 22B. Then, grow p-GaN in the opening to form a p-GaN inverted trapezoidal gate structure 26. Afterwards, the gate electrode is coated using metal coating. Finally, the silicon oxynitride mask layer 20 is removed and the metal outside the gate electrode region is lift off, forming the self-aligned gate metal on the p-GaN inverted trapezoidal structure 26 as the first gate metal layer 103, as the structure shown in FIG. 22C.

Then, like the steps S74 to S76, the source and drain electrodes 28, 30, 28′, 30′ are formed sequentially; device isolation structures 32, 34 are fabricated; metal vapor deposition and lift-off methods are used to form the metal layer 36, which acts as the bonding pad regions for the gate, drain, and source electrodes or as the interconnection metal, as shown in FIGS. 22E-1 to 22F-2.

Then, as the step S77, a patterned passivation layer 40 is grown, as shown in FIG. 22G-1 or FIG. 22G-2. The thickness of this patterned passivation layer 40 is greater than 1000 Å. By taking advantage of the stress generated by the passivation layer 40, the polarity of the active region (i-Al_(x)GaN layer 16/i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14) can be inverted from N-face to Ga-face, and hence the 2DEG 6 can be moved from the i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14 interface of the i-GaN channel layer 15 to the i-Al_(x)GaN layer 16/i-GaN channel layer 15 interface of the i-GaN channel layer 15. Because the p-GaN is an inverted trapezoidal structure 26, a sloped capacitor will be formed in the circle shown in the figures. This capacitor will induce the field plate effect having the main function of dispersing the high-density electric field below the gate electrode. In addition to increasing the breakdown voltage Vds between the drain and the source of the HEMT, it also suppresses the electron trapping effect below the gate electrode and hence reducing current collapse during the operation of the HEMT.

Finally, metal vapor deposition and metal lift-off methods are adopted to form the D-mode HEMT field plate metal 62, as the structures shown in FIG. 21A-1, 21A-2, and 21B.

Embodiment 11: A SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/Gan HEMT 100 with polarity inversion connected in series with a D-mode N-face AlGaN/GaN HEMT with polarity inversion and gate dielectric layer to form a hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion.

As shown in FIGS. 23A-1, 23A-2, and 23B, the main feature of the hybrid E-mode N-face AlGaN/GaN HEMT with polarity inversion according to the present embodiment is the epitaxial structure 10 of N-face AlGaN/GaN, which is divided to a left region and a right region. An E-mode AlGaN/GaN HEMT 100 is located in the left region. The SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion includes a p-GaN inverted trapezoidal gate structure 26, a first source metal layer 28′, a first drain metal layer 30′, a first source ion implantation region 101, a first drain ion implantation region 102, and a self-aligned first gate metal layer 103. The p-GaN inverted trapezoidal gate structure 26, the first source metal layer 28′, and the first drain metal layer 30′ are located on the i-Al_(x)GaN layer 16. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal gate structure 26 in the i-GaN channel layer 15 will be depleted. The first source ion implantation region 101 and the first drain ion implantation region 102 are located in the i-Al_(x)GaN layer 16. Besides, the first source ion implantation region 101 is located below the first source metal layer 28′ while the first drain ion implantation region 102 is located below the first drain metal layer 30′. In addition, the self-aligned first gate metal layer 103 is located on the p-GaN inverted trapezoidal gate structure 26.

A D-mode N-face AlGaN/GaN HEMT 120 with gate dielectric layer is disposed in the right region. It includes a second source metal layer 28′, a second drain metal layer 30′, a gate oxide layer 72, a second source ion implantation region 101′, and a second drain ion implantation region 102′. The second source metal layer 28′ and the second drain metal layer 30′ are located on the i-Al_(x)GaN layer 16. The gate oxide layer 72 is located on the i-Al_(x)GaN layer 16 and between second source metal layer 28′ and the second drain metal layer 30′. The second source ion implantation region 101′ is located below the second source metal layer 28′ while the second drain ion implantation region 102′ is located below the second drain metal layer 30′.

The process steps of the present embodiment are roughly identical to those of Embodiment 9. The main difference is the gate oxide layer 72 for the D-mode HEMT 120 in the right region after the step for device isolation, as shown in FIG. 24A-1 or FIG. 24A-2. Afterwards, the metal layer 36 is formed sequentially for the gate, drain, and source electrodes bonding pad regions or the interconnection metal, as the structure shown in FIG. 24A-1 and FIG. 24A-2. Next, a patterned passivation layer 40 is formed to cover the above devices, and the portions of the metal layer for subsequent bonding and connecting are exposed, as sown in FIGS. 23A-1, 23A-2, and 23B. According to the present embodiment, the thickness of this patterned passivation layer 40 is greater than 1000 Å.

Because the p-GaN is an inverted trapezoidal structure 26, a sloped capacitor will be formed in the circle shown in FIG. 23A-1 and FIG. 23A-2. This capacitor will induce the field plate effect having the main function of dispersing the high-density electric field below the gate electrode. In addition to increasing the breakdown voltage Vds between the drain and the source of the HEMT, it also suppresses the electron trapping effect below the gate electrode and hence reducing current collapse during the operation of the HEMT.

Embodiment 11: An SEG p-GaN anode N-face AlGaN/GaN SBD 130 with polarity inversion connected in series with an SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion to form a hybrid N-face AlGaN/GaN SBD with polarity inversion.

As shown in FIGS. 25A-1, 25A-2, and 25B, the main feature of the hybrid N-face AlGaN/GaN SBD with polarity inversion according to the present embodiment is the epitaxial structure 10 of N-face AlGaN/GaN, which is divided to a left region and a right region. An SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion is located in the left region and includes a p-GaN inverted trapezoidal gate structure 26, a first source metal layer 28′, a first drain metal layer 30′, a first source ion implantation region 101, a first drain ion implantation region 102, and a self-aligned first gate metal layer 103. The p-GaN inverted trapezoidal gate structure 26, the first source metal layer 28′, and the first drain metal layer 30′ are located on the i-Al_(x)GaN layer 16. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal gate structure 26 in the i-GaN channel layer 15 will be depleted. The first source ion implantation region 101 and the first drain ion implantation region 102 are located in the i-Al_(x)GaN layer 16. Besides, the first source ion implantation region 101 is located below the first source metal layer 28′ while the first drain ion implantation region 102 is located below the first drain metal layer 30′. In addition, the self-aligned first gate metal layer 103 is located on the p-GaN inverted trapezoidal gate structure 26.

A p-GaN anode N-face AlGaN/GaN SBD 130 with polarity inversion is formed in the right region. It includes a cathode metal layer 84, a p-GaN inverted trapezoidal anode structure 82, and a first cathode ion implantation region 134. The cathode metal layer 84 and the p-GaN inverted trapezoidal anode structure 82 are located on the i-Al_(x)GaN layer 16. Although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal anode structure 82, the 2DEG 6 below the p-GaN inverted trapezoidal anode structure 82 in the i-GaN channel layer 15 will be depleted. Besides, the first cathode ion implantation region 134 is located in the i-Al_(x)GaN layer 16 and below the cathode metal layer 84.

According to the process steps of the present embodiment, first, the left region of the epitaxial structure 10 is set to fabricate the SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion while the right region is set to fabricate the SEG p-GaN anode N-face AlGaN/GaN SBD 130 with polarity inversion.

A source ion implantation region 101 and a drain ion implantation region 102 are formed in the left region and the cathode ion implantation region 134 is formed in the right region concurrently. These ion implantation regions are also activated. A patterned mask layer is formed on the epitaxial structure 10 of AlGaN/GaN HEMT. An inverted-trapezoidal-gate opening is located on the left region of the epitaxial layer; an inverted-trapezoidal-anode opening is located on the right region of the epitaxial layer. Then p-GaN is grown in the inverted-trapezoidal-gate opening and the inverted-trapezoidal-anode opening for forming a p-GaN inverted trapezoidal gate structure 26 in the left region and a p-GaN inverted anode structure 82 in the right region. By using self-alignment, form a self-aligned gate metal 103 on the p-GaN inverted trapezoidal gate structure 26. Afterwards, the patterned mask layer is removed.

Then, the source and drain electrodes 28′, 30′ and the cathode metal layer 84 are formed sequentially; device isolation is fabricated; metal vapor deposition (normally Ni/Au) and lift-off methods are used to form the metal layer 36, which acts as the bonding pad regions for the gate, drain, and source electrodes and cathode or as the interconnection metal. Finally, a patterned passivation layer 40 is covered and only the metal region for electrical connection is exposed.

Embodiment 12: An N-face AlGaN/GaN SBD 140 with polarity inversion and field-plate anode connected in series with an SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 140 with polarity inversion to form a hybrid N-face AlGaN/GaN SBD 140 with polarity inversion.

As shown in FIGS. 26A-1, 26A-2, and 26B, the main feature of the hybrid N-face AlGaN/GaN SBD with polarity inversion according to the present embodiment is the epitaxial structure 10 of AlGaN/GaN, which is divided to a left region and a right region. An SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion is located in the left region and includes a p-GaN inverted trapezoidal gate structure 26, a first source metal layer 28′, a first drain metal layer 30′, a first source ion implantation region 101 and a first drain ion implantation region 102, and a self-aligned first gate metal layer 103. The p-GaN inverted trapezoidal gate structure 26, the first source metal layer 28′, and the first drain metal layer 30′ are located on the i-Al_(x)GaN layer 16. In addition, although the 2DEG 6 is formed at the junction i-Al_(x)GaN/i-GaN of the i-GaN channel layer 15, due to the existence of the p-GaN inverted trapezoidal gate structure 26, the 2DEG 6 below the p-GaN inverted trapezoidal gate structure 26 in the i-GaN channel layer 15 will be depleted. The first source ion implantation region 101 and the first drain ion implantation region 102 are located in the i-Al_(x)GaN layer 16. Besides, the first source ion implantation region 101 is located below the first source metal layer 28′ while the first drain ion implantation region 102 is located below the first drain metal layer 30′. In addition, the self-aligned first gate metal layer 103 is located on the p-GaN inverted trapezoidal gate structure 26.

An N-face AlGaN/GaN SBD 140 with polarity inversion and field-plate anode is formed in the right region. It includes a cathode metal layer 84, a field-plate-anode dielectric layer 92, and a first cathode ion implantation region 134. The cathode metal layer 84 and the field-plate-anode dielectric layer 92 are located on the i-Al_(x)GaN layer 16. Besides, the first cathode ion implantation region 134 is located in the i-Al_(x)GaN layer 16 and below the cathode metal layer 84.

According to the process steps of the present embodiment, first, the left region of the epitaxial structure 10 of AlGaN/GaN HEMT is set to fabricate the SEG p-GaN gate and self-aligned gate metal E-mode N-face AlGaN/GaN HEMT 100 with polarity inversion while the right region is set to fabricate the N-face AlGaN/GaN SBD 140 with polarity inversion and field-plate anode.

The source ion implantation region 101 and the drain ion implantation region 102 are formed in the left region and the cathode ion implantation region 134 is formed in the right region concurrently. These ion implantation regions are also activated. Then, form a p-GaN inverted trapezoidal gate structure 26 in the left region. By using self-alignment, form a self-aligned gate metal layer as the first gate metal layer 103 on the p-GaN inverted trapezoidal gate structure 26.

Next, the source and drain electrodes 28, 30 and the cathode metal layer 84 are formed sequentially. Device isolation is also fabricated subsequently.

After device isolation, the field-plate-anode dielectric layer 92 is formed in the right region. Afterwards, metal vapor deposition (normally Ni/Au) and lift-off methods are used to form the metal layer 36, which acts as the bonding pad regions for the gate, drain, and source electrodes and cathode or as the interconnection metal. Finally, a patterned passivation layer 40 is covered and only the metal region for electrical connection is exposed. According to the present embodiment, the thickness of the patterned passivation layer 40 is greater than 1000 Å.

The present invention provides an epitaxial structure 10 of N-face AlGaN/GaN, its active device, and the method for fabricating the same with integration and polarity inversion. The benefit of the present invention is fewer defects in i-Al_(x)GaN if grown in N-face polarity. According to the fabrication of the present invention, by taking advantage of the stress generated by the passivation layer 40, the polarity can be inverted from N-face to Ga-face, and hence the 2DEG 6 can be moved from the i-GaN channel layer 15/i-Al_(y)GaN buffer layer 14 interface of the i-GaN channel layer 15 to the i-Al_(x)GaN layer 16/i-GaN channel layer 15 interface of the i-GaN channel layer 15. In addition to suppressing the surface defects of i-Al_(x)GaN, the original i-Al_(y)GaN can block the electrons in the defects of the buffer layer from entering the channel layer and hence reducing current collapse. Thereby, the present invention provides a novel active device and the fabrication method for integration.

Accordingly, the present invention conforms to the legal requirements owing to its novelty, nonobviousness, and utility. However, the foregoing description is only embodiments of the present invention, not used to limit the scope and range of the present invention. Those equivalent changes or modifications made according to the shape, structure, feature, or spirit described in the claims of the present invention are included in the appended claims of the present invention. 

What is claimed is:
 1. An epitaxial structure of N-face AlGaN/GaN, comprising: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 2. The structure of claim 1, wherein an i-Al_(z)GaN grading buffer layer is further disposed between said C-doped i-GaN layer and said i-Al_(y)GaN buffer layer and z=0.01˜0.75.
 3. A method for fabricating an enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion using said epitaxial structure of claim 1, comprising steps of: providing an epitaxial structure of N-face AlGaN/GaN; and forming a p-GaN inverted trapezoidal gate structure on said epitaxial structure of N-face AlGaN/GaN using selective epitaxial growth for controlling the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure to be depleted; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 4. The method of claim 3, and in said step of forming said p-GaN inverted trapezoidal gate structure on said epitaxial structure of N-face AlGaN/GaN, further comprising steps of: forming a silicon oxynitride mask layer on said epitaxial structure of N-face AlGaN/GaN; exposing and developing said silicon oxynitride mask layer for defining a gate selective epitaxial growth region; etching said gate selective epitaxial growth region using buffered oxide etchant for forming an inverted trapezoidal structure; growing p-GaN in said inverted trapezoidal structure for forming said p-GaN inverted trapezoidal gate structure; and removing said silicon oxynitride mask layer.
 5. A selective-epitaxial-growth p-GaN gate enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, comprising: an epitaxial structure of AlGaN/GaN; and a p-GaN inverted trapezoidal gate structure, located on an i-Al_(x)GaN layer; where the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure is depleted, and said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and said i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 6. A method for fabricating a hybrid enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion using said epitaxial structure of claim 1, comprising steps of: providing an epitaxial structure of N-face AlGaN/GaN, and dividing said epitaxial structure of N-face AlGaN/GaN into a left region and a right region; forming a selective-epitaxial-growth p-GaN gate enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion in said left region by steps comprising: forming a p-GaN inverted trapezoidal gate structure on said epitaxial structure of N-face AlGaN/GaN using selective epitaxial growth for controlling the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure to be depleted; and forming a depletion-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion and without gate dielectric layer in said right region; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 7. The method of claim 6, wherein said selective-epitaxial-growth p-GaN gate enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion and said depletion-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion and without gate dielectric layer are fabricated concurrently.
 8. A hybrid enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, comprising: an epitaxial structure of N-face AlGaN/GaN, divided into a left region and a right region; a selective-epitaxial -growth p-GaN gate enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, located in said left region, comprising a p-GaN inverted trapezoidal gate structure, and the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure being depleted; and a depletion-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion and without gate dielectric layer, located in said right region; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 9. A method for fabricating a hybrid enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, comprising steps of: providing an epitaxial structure of N-face AlGaN/GaN, and dividing said epitaxial structure of N-face AlGaN/GaN into a left region and a right region; forming a selective-epitaxial-growth p-GaN gate enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion in said left region by steps comprising: forming a p-GaN inverted trapezoidal gate structure on said epitaxial structure of N-face AlGaN/GaN using selective epitaxial growth for controlling the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure to be depleted; and forming a depletion-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion and gate dielectric layer in said right region; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 10. A hybrid enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, comprising: an epitaxial structure of N-face AlGaN/GaN, divided into a left region and a right region; a selective-epitaxial-growth p-GaN gate enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, located in said left region, comprising a p-GaN inverted trapezoidal gate structure, and the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure being depleted; and a depletion-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion and gate dielectric layer, located in said right region; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 11. A method for fabricating a selective-epitaxial-growth p-GaN gate enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, comprising steps of: providing an epitaxial structure of N-face AlGaN/GaN; forming a first source ion implantation region and a first drain ion implantation region in said i-Al_(x)GaN layer; forming a p-GaN inverted trapezoidal gate structure on said epitaxial structure of N-face AlGaN/GaN using selective epitaxial growth; forming a first gate metal layer on said p-GaN inverted trapezoidal gate structure; and forming a first source metal layer and a first drain metal layer on said epitaxial structure of N-face AlGaN/GaN, said first source metal layer located on said first source ion implantation region, and said first drain metal layer located on said first drain ion implantation region; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 12. The method of claim 11, and in said steps of forming said p-GaN inverted trapezoidal gate structure and said first gate metal layer, further comprising steps of: forming a silicon oxynitride mask layer on said epitaxial structure of N-face AlGaN/GaN; forming an inverted trapezoidal structure by patterning said silicon oxynitride mask layer using a patterned photoresist layer and buffered oxide etchant; growing p-GaN in said inverted trapezoidal structure for forming said p-GaN inverted trapezoidal gate structure; forming a first metal layer on the surfaces of said silicon oxynitride mask layer and said p-GaN inverted trapezoidal gate structure; and removing said silicon oxynitride mask layer and said metal layer on said silicon oxynitride mask layer, and reserving the first metal layer on the surface of said p-GaN inverted trapezoidal gate structure for acting as said first gate metal layer.
 13. The method of claim 11, and in said step of forming said first source ion implantation region and said first drain ion implantation region in said i-Al_(x)GaN layer, further comprising steps of: forming an ion implantation buffer layer on said epitaxial structure of N-face AlGaN/GaN; forming a patterned photoresist layer on said ion implantation buffer layer and exposing a portion of said ion implantation buffer layer; doping n-type silicon to said ion implantation buffer layer exposed from said patterned photoresist layer and activating for forming said first source ion implantation region and said first drain ion implantation region in said i-Al_(x)GaN layer; and removing said patterned photoresist layer and said ion implantation buffer layer.
 14. The method of claim 13, wherein said activation is performed by a thermal treatment at a temperature between 600° and 900°.
 15. A selective-epitaxial-growth p-GaN gate and self-aligned gate metal enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, comprising: an epitaxial structure of N-face AlGaN/GaN; a p-GaN inverted trapezoidal gate structure, a first source metal layer, and a first drain metal layer, located on said i-Al_(x)GaN layer, and the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure being depleted; a first source ion implantation region and a first drain ion implantation region, located in said i-Al_(x)GaN layer, said first source ion implantation region located below said first source metal layer, and said first drain ion implantation region located below said first drain metal layer; and a first gate metal layer, located on said p-GaN inverted trapezoidal gate structure; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 16. A method for fabricating a hybrid enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, comprising steps of: providing an epitaxial structure of N-face AlGaN/GaN, and dividing said epitaxial structure of N-face AlGaN/GaN into a left region and a right region; forming a selective-epitaxial-growth p-GaN gate and self-aligned gate metal enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion in said left region by steps comprising: forming a first source ion implantation region and a first drain ion implantation region in said i-Al_(x)GaN layer; forming a p-GaN inverted trapezoidal gate structure on said epitaxial structure of N-face AlGaN/GaN using selective epitaxial growth and the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure being depleted; forming a first gate metal layer on said p-GaN inverted trapezoidal gate structure; and forming a first source metal layer and a first drain metal layer on said epitaxial structure of AlGaN/GaN, said first source metal layer located on said first source ion implantation region, and said first drain metal layer located on said first drain ion implantation region; and forming a depletion-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion and without gate dielectric layer in said right region by steps comprising: forming a second source ion implantation region and a second drain ion implantation region in said i-Al_(x)GaN layer; and forming a second source metal layer and a second drain metal layer on said epitaxial structure of N-face AlGaN/GaN, said second source metal layer located on said second source ion implantation region, and said second drain metal layer located on said second drain ion implantation region; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 17. The method of claim 16, and in said step of forming said first source ion implantation region, said first drain ion implantation region, said second source ion implantation region, and said second drain ion implantation region in said i-Al_(x)GaN layer, further comprising steps of: forming an ion implantation buffer layer on said epitaxial structure of N-face AlGaN/GaN; forming a patterned photoresist layer on said ion implantation buffer layer and exposing a portion of said ion implantation buffer layer; doping n-type silicon to said ion implantation buffer layer exposed from said patterned photoresist layer and activating for forming said first source ion implantation region, said first drain ion implantation region, said second source ion implantation region, and said second drain ion implantation region in said i-Al_(x)GaN layer; and removing said patterned photoresist layer and said ion implantation buffer layer.
 18. The method of claim 17, wherein said activation is performed by a thermal treatment at a temperature between 600° and 900°.
 19. A hybrid enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, comprising: an epitaxial structure of N-face AlGaN/GaN, divided into a left region and a right region; a selective-epitaxial-growth p-GaN gate and self-aligned gate metal enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, located in said left region, comprising: a p-GaN inverted trapezoidal gate structure, a first source metal layer, and a first drain metal layer, located on said i-Al_(x)GaN layer, and the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure being depleted; a first source ion implantation region and a first drain ion implantation region, located in said i-Al_(x)GaN layer, said first source ion implantation region located below said first source metal layer, and said first drain ion implantation region located below said first drain metal layer; and a first gate metal layer, located on said p-GaN inverted trapezoidal gate structure; and a depletion-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion and without gate dielectric layer, located in said right region, comprising: a second source metal layer and a second drain metal layer, located on said i-Al_(x)GaN layer; and a second source ion implantation region and a second drain ion implantation region, located in said i-Al_(x)GaN layer, said second source ion implantation region located below said second source metal layer, and said second drain ion implantation region located below said second drain metal layer; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 20. A method for fabricating a hybrid enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, comprising steps of: providing an epitaxial structure of N-face AlGaN/GaN, and dividing said epitaxial structure of N-face AlGaN/GaN into a left region and a right region; forming a selective-epitaxial-growth p-GaN gate and self-aligned gate metal enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion in said left region by steps comprising: forming a first source ion implantation region and a first drain ion implantation region in said i-Al_(x)GaN layer; forming a p-GaN inverted trapezoidal gate structure on said epitaxial structure of N-face AlGaN/GaN using selective epitaxial growth and the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure being depleted; forming a first gate metal layer on said p-GaN inverted trapezoidal gate structure; and forming a first source metal layer and a first drain metal layer on said epitaxial structure of N-face AlGaN/GaN, said first source metal layer located on said first source ion implantation region, and said first drain metal layer located on said first drain ion implantation region; and forming a depletion-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion and gate dielectric layer in said right region by steps comprising: forming a second source ion implantation region and a second drain ion implantation region in said i-Al_(x)GaN layer; forming a second source metal layer and a second drain metal layer on said epitaxial structure of N-face AlGaN/GaN, said second source metal layer located on said second source ion implantation region, and said second drain metal layer located on said second drain ion implantation region; and forming a gate dielectric layer on said epitaxial structure of N-face AlGaN/GaN; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75.
 21. The method of claim 20, and in said step of forming said first source ion implantation region, said first drain ion implantation region, said second source ion implantation region, and said second drain ion implantation region in said i-Al_(x)GaN layer, further comprising steps of: forming an ion implantation buffer layer on said epitaxial structure of N-face AlGaN/GaN; forming a patterned photoresist layer on said ion implantation buffer layer and exposing a portion of said ion implantation buffer layer; doping n-type silicon to said ion implantation buffer layer exposed from said patterned photoresist layer and activating for forming said first source ion implantation region, said first drain ion implantation region, said second source ion implantation region, and said second drain ion implantation region in said i-Al_(x)GaN layer; and removing said patterned photoresist layer and said ion implantation buffer layer.
 22. The method of claim 21, wherein said activation is performed by a thermal treatment at a temperature between 600° and 900°.
 23. A hybrid enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion of claim 1, comprising: an epitaxial structure of N-face AlGaN/GaN, divided into a left region and a right region; a selective-epitaxial-growth p-GaN gate and self-aligned gate metal enhancement-mode N-face AlGaN/GaN high electron mobility transistor with polarity inversion, located in said left region, comprising: a p-GaN inverted trapezoidal gate structure, a first source metal layer, and a first drain metal layer, located on said i-Al_(x)GaN layer, and the two-dimensional electron gas below said p-GaN inverted trapezoidal gate structure being depleted; a first source ion implantation region and a first drain ion implantation region, located in said i-Al_(x)GaN layer, said first source ion implantation region located below said first source metal layer, and said first drain ion implantation region located below said first drain metal layer; and a first gate metal layer, located on said p-GaN inverted trapezoidal gate structure; and a depletion-mode N-face AlGaN/GaN high electron mobility transistor with gate dielectric layer, located in said right region, comprising: a second source metal layer and a second drain metal layer, located on said i-Al_(x)GaN layer; a gate dielectric layer, located on said i-Al_(x)GaN layer and between said second source metal layer and said second drain metal layer; and a second source ion implantation region and a second drain ion implantation region, located in said i-Al_(x)GaN layer, said second source ion implantation region located below said second source metal layer, and said second drain ion implantation region located below said second drain metal layer; where said epitaxial structure of N-face AlGaN/GaN comprises: a substrate; a C-doped buffer layer, located on said substrate; a C-doped i-GaN layer, located on said C-doped buffer layer; an i-Al_(y)GaN buffer layer, located on said C-doped i-GaN layer; an i-GaN channel layer, located on said i-Al_(y)GaN buffer layer; and an i-Al_(x)GaN layer, located on said i-GaN channel layer; where x=0.1˜0.3; y=0.05˜0.75. 